Maro Publications

Porogens

Notes

*4/13/2013 
from 4/13/2013

Maro Encyclopedia

Comments

Patent Abstracts

Patent Titles

Compounding

Foams

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Notes

Porogens form  porosity in the "matrix" dielectric, without the structure of the film collapsing, that is to say to obtain a film that still has sufficient mechanical properties.

“This step, during which this porosity is created in the "matrix", conditions the final success of the production of these films and the mechanical quality of the layers mainly depends on the choice of the matrix molecule and pore-forming molecule combination.

The hybrid material should preferably be both capable of releasing matter under the effect of a treatment, while keeping a stable framework during this release step, but also during the subsequent steps of manufacturing the semiconductor, especially during the steps of polishing the dielectric layers.

The invention proposes to solve the problem posed by the selection of suitable pore-forming organic precursor molecules which, in combination with the "matrix" molecules, will make it possible to generate, on a substrate, a matrix precursor and organic precursor film that has a very low dielectric constant, while enabling the film to have good mechanical strength”

[Vautier and Sandre, US Patent 8,398,885 (3/19/2013)]

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Interested!!
Bookmark this page to follow future developments!.
(RDC 6/5/2012)

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Roger D. Corneliussen
Editor
www.maropolymeronline.com

Maro Polymer Links
Tel: 610 363 9920
Fax: 610 363 9921
E-Mail: cornelrd@bee.net  

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Copyright 2013 by Roger D. Corneliussen.
No part of this transmission is to be duplicated in any manner or forwarded by electronic mail without the express written permission of Roger D. Corneliussen
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* Date of latest addition; date of first entry is 4/13/2013.