Maro Publications

Polyhedral Oligomeric Silsesquioxane (POSS)


from 7/12/2013

Maro Topics


Patent Abstracts

Patent Titles





“A silsesquioxane is a compound with the empirical chemical formula RSiO3/2 where Si is the element silicon, O is oxygen and R is either hydrogen or an alkyl, alkene, aryl, arylene group. These materials can be used as a support for catalysts, and recently on pH-responsive material.  Silsesquioxanes can have a cage like structure which is most commonly cubes, hexagonal prisms, octagonal prisms, decagonal and dodecagonal prisms.” (Wikipedia, Silsesquioxanes, 7/15/20912


“POSS systems have found use in hybrid inorganic/organic polymers. Ladder-like silsesquioxane polymers have found applications in photoresist coatings for electronic and optical devices, interlayer dielectrics and protective coating films for semiconductor devices, liquid crystal display elements, magnetic recording media, optical fiber coatings, gas separation membranes, binders for ceramics and as carcinostatic drugs (Li et al., J. Inorg. Organomet. Polym. 2002, 11(3), 123-154). ”

“In the area of surface modification and corrosion prevention, POSS systems have been used as surface modifiers, dispersion agents, coupling agents, crosslinking agents, adhesion promoters, co-monomers, moisture scavengers and corrosion protection agents (Id.). In biomedical science, POSS has been used in place of fumed-silica which is typically used as a filler for improving the chemical, physical and biological properties of membranes used in immunoisolatory applications (Pittman et al., J. Macromol. Symp. 2003, 196, 301-325).”

[Kolel-Veetil and Keller, US Patent 8,211,944 (7/3/2012)]


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(RDC 6/5/2012)


Roger D. Corneliussen

Maro Polymer Links
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Copyright 2012 by Roger D. Corneliussen.
No part of this transmission is to be duplicated in any manner or forwarded by electronic mail without the express written permission of Roger D. Corneliussen

* Date of latest addition; date of first entry is 7/15/2012.